| 许全忠,庞 阔,陈 诚,王延来.微米尺度孔径微透镜阵列残余应力测量及分析[J].电子测量与仪器学报,2023,37(6):214-221 |
| 微米尺度孔径微透镜阵列残余应力测量及分析 |
| Measurement and analysis of residual stress inmicrolens array with micro aperture |
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| DOI： |
| 中文关键词: 微透镜阵列 双折射效应 残余应力 微注塑 |
| 英文关键词:microlens array birefringent effect residual stress microinjection molding |
| 基金项目:天津市教委科研计划项目(2021KJ175)、大学生科技创新项目( JDG21054)、天津市研究生科研创新项目(2021YJSS289)、天津市高
等学校大学生创新创业训练计划项目(202110069001)资助 |
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| 中文摘要: |
| 微透镜阵列在现代光学领域发挥着重要作用,对阵列器件进行残余应力测量从而评价器件质量,指导优化制造工艺具
有切实的研究意义。 现有的测量研究多着重于对阵列器件整体进行应力测量,对微透镜单元的应力分布尚未有系统的测量研
究。 本文基于双折射原理,分别使用光弹系统/ 偏光显微镜,在宏观/ 微观尺度对不同基底厚度(0. 5 mm/ 1 mm),不同单元排布
方式(相切排布/ 紧密排布),不同微透镜单元口径(126 μm/ 1 mm)的微透镜阵列器件进行了测量研究,并对器件整体(宏观)应
力分布规律和透镜单元(微观)应力分布进行了比对和总结。 实验结果表明:微透镜阵列的残余应力分布较为均匀,器件宏观
残余应力分布与微观区域残余应力存在较为显著的趋同性;在厚度相同的前提下,排布方式、孔径尺寸对残余应力分布影响较
小;当阵列器件厚度由 1 mm 减小至 0. 5 mm 时,方形孔径微透镜阵列,同一区域残余应力增加约 250%;圆形孔径微透镜阵列,
同一个测量区域下残余应力增加约 150%。 相同孔径/ 排布/ 区域内的残余应力增幅明显。 |
| 英文摘要: |
| Microlens array plays an important role in the field of modern optics. It is of practical significance to evaluate the quality of
array devices by measuring residual stress and guiding the optimization of manufacturing process. Most of the existing measurement
studies focus on the stress measurement of the whole array device, but the stress distribution of the microlens unit has not been
systematically measured. Based on the principle of birefringence, this paper uses photoelastic system/ polarizing microscope respectively
to measure and study microlens array devices with different base thickness ( 0. 5 mm/ 1 mm), different unit arrangement ( tangent
arrangement / tight arrangement) and different microlens unit calibers (126 μm/ 1 mm) at macro / micro scale. The stress distribution law
of the whole device ( macroscopic) and the stress distribution of the lens unit ( microscopic) are compared and summarized. The
experimental results show that the residual stress distribution of the microlens array is uniform, and there is a significant convergence
between the macro residual stress distribution and the micro residual stress. Under the premise of the same thickness, the distribution of
residual stress is less affected by the arrangement and aperture size. When the thickness of the array decreases from 1 mm to 0. 5 mm,
the residual stress in the same area of the square aperture microlens array increases by about 250%. For the thickness of the circular
aperture microlens array, the residual stress increases by about 150% in the same measuring area. The residual stress increases
significantly within the same aperture / configuration / region, decreases from 1 mm to 0. 5 mm, the residual stress in the same observation
area increases by about 150%. |
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