胡钧铭,戴 强,刘 军,徐 江,宋丹路.MEMS 电容型器件边缘效应研究[J].电子测量与仪器学报,2023,37(2):76-82
MEMS 电容型器件边缘效应研究
Research on fringing effect of MEMS capacitive devices
  
DOI:
中文关键词:  边缘效应模型  MEMS 电容型器件  保角映射变换  有限元仿真
英文关键词:MEMS capacitive device  fringing effect model  conformal mapping transformation  finite element simulation
基金项目:国家重点研发计划(2020YFB1807700)、中国电子科技集团 2021 产业资金(C211)项目资助
作者单位
胡钧铭 1. 制造过程测试技术教育部重点实验室 
戴 强 1. 制造过程测试技术教育部重点实验室 
刘 军 2. 电子科技大学通信抗干扰国家级重点实验室 
徐 江 3. 中国电科芯片技术研究院 
宋丹路 1. 制造过程测试技术教育部重点实验室 
AuthorInstitution
Hu Junming 1. Key Laboratory of Testing Technology for Manufacturing Process, Ministry of Education 
Dai Qiang 1. Key Laboratory of Testing Technology for Manufacturing Process, Ministry of Education 
Liu Jun 2. National Key Laboratory of Science and Technology on Communications 
Xu Jiang 3. China Electronics Chip Technology Research Institute 
Song Danlu 1. Key Laboratory of Testing Technology for Manufacturing Process, Ministry of Education 
摘要点击次数: 624
全文下载次数: 702
中文摘要:
      MEMS 电容型器件在工作过程中,其电容通常情况下为非正对的极板,边缘效应不容忽视。 为解决此问题,基于保角映 射变换和复变函数相关理论,通过继承传统模型并加以修正,得出电容极板在非正对情况下的边缘效应模型。 经过与有限元仿 真、传统 Heerens 模型、Huang 模型的对比,表明当电容极板从正对到完全移开的过程中,本文模型与有限元仿真的误差在 10% ~20%之间,优于传统 Heerens 模型与 Huang 模型。 进一步,根据本文模型,当极板重合度低于 40%时,边缘效应呈快速增 长,此时其电容值可用本文模型进行计算。 以上结论均得到了 MEMS 阵列电容数字式实验验证。 研究对电容型 MEMS 器件的 设计与性能分析具参考作用。
英文摘要:
      In the working process of MEMS capacitive devices, the capacitor plates are usually not in the very opposite position but in an inclined position, which will induce the fringing field effect and cannot be ignored. Based on conformal mapping transformation and complex function correlation theory, the fringing effect model is proposed by inheriting the traditional models and modifying them. Compared with the traditional Heerens’ and Huang’s model, the proposed model is better because the error between the proposed model and the finite element simulation, which is from 10% to 20% when the capacitor plate is moved from perfectly aligned to completely misaligned, is less than that between the traditional Heerens’ s and Huang’ s model. Furthermore, according to the proposed model, when the plate coincidence degree is lower than 40%, the fringing effect increases rapidly. As a result, the proposed model should be applied to correct the capacitance. All above are verified by a digital experiment concerned with MEMS differential capacitor array. The research is helpful for the design and performance analysis of capacitive MEMS devices.
查看全文  查看/发表评论  下载PDF阅读器